UniMill
The new UniMill (code IV7) model of Technoorg ion mills has been designed for extremely rapid preparation of high quality TEM/XTEM samples with unsurpassed high thinning rate. The design of the instrument enables both rapid milling with the ultra high-energy noble gas ion source followed by final polishing and cleaning with the patented low-energy ion gun.
STATE-OF-THE-ART ION SOURCES
The UniMill includes two independently controlled ion sources: one high- or ultra high-energy ion gun and one low-energy ion gun.
High- and ultra-high-energy ion sources: Technoorg’s high- and ultra high-energy ion sources provide the highest milling rate in the market. The ion gun operating up to 16 keV is especially designed for TEM sample preparation for materials of very low milling rate.
Low-energy ion source: The exceptional construction of the ion source allows it to reach high beam current densities in the whole operating range. The beam of extremely low-energy noble gas ions guarantees the minimization of surface damage and ion beam induced amorphization.
Ion source control: All ion gun parameters including accelerating voltage and beam current are controlled automatically by a digital feedback loop, but they can always be changed manually during the sample preparation process. The initial values of the ion source parameters are set either automatically or manually and are continuously monitored and displayed by the computer.
AUTOMATED OPERATION
The UniMill model of Technoorg ion mills is provided with full computer control utilizing an easy-to-use graphical interface. All milling parameters including the electrode voltages, working gas flow, sample motion/tilt, and further parameters of process timing and perforation detection can be stored or pre-programmed in an arbitrary number of steps. This fully automated feature of the UniMill allows to produce high-quality samples with minimum user intervention.
APPLICATIONS
The UniMill is recommended to users developing new materials or new sample preparation methods and due to its extreme milling rate it is also recommended for studying materials of very low sputtering rate, such as diamond, sapphire, etc. Its exclusive capability of producing damage- and artifact-free samples by low-energy ion bombardment that provides a unique opportunity to study real nanostructures in synthesized and natural materials in all fields of technical sciences and materials research.
OPTIONAL LIQUID NITROGEN COOLING
This feature reduces excessive sample heating during the ion bombardment. Thus, heat-sensitive materials can be prepared without destabilization of internal structures.
ON-LINE MONITORING AND SUPPORT
The UniMill is supplied with a software extension for online technical support, which enables instant error detection and problem elimination via the Internet.
SPECIFICATIONS
ION SOURCES
Ultra high-energy ion source:
- Ion energy: up to 16 keV, continuously adjustable
- Beam current: up to 500 μA
- Broad ion beam diameter: 1.6 - 1.8 mm (FWHM)
High-energy ion source (standard configuration):
- Ion energy: up to 10 keV, continuously adjustable
- Beam current: up to 200 μA
- Broad ion beam diameter: 0.9 - 1.3 mm (FWHM)
Low-energy ion source:
- Ion energy:100 - 2000 eV, continuously adjustable
- Beam current: 7 - 80 μA
- Beam diameter: 0.75 - 1.2 mm (FWHM)
SPECIMEN STAGE
- Milling angle: 0° - 40°, electronically adjustable in 0.1° increments
- Computer controlled in-plane specimen movement:
- rotation in 360°
- oscillation from +10° to +60° in 10° steps
- Remarkable thickness range of the accepted TEM samples (30 - 200 µm)
VACUUM SYSTEM
- Pfeiffer vacuum system with oil-free diaphragm and turbomolecular pumps equipped with compact, full-range Pirani/Penning vacuum gauge
GAS SUPPLY SYSTEM
- 99.999% purity argon gas of 1.3 - 1.7 bar absolute pressure
- Dedicated pressure regulator for noble gas service with electronic outlet pressure monitoring
- High-precision working gas flow control via motorized needle valve
IMAGING SYSTEM
- CMOS camera image for full visual control and milling supervision/termination
- High-resolution (5 Mpixel) color CMOS camera
- Manual zoom video lens of 50 - 400× magnification range
COMPUTER CONTROL
- Built-in industrial grade PC
- Easy-to-use graphical interface and image analysis module
- User-independent ion source setup including gas flow regulation by motorized needle valve
- Pre-programmed milling recipes for automatic setting of mechanical and electronic milling parameters (manual adjustment is also possible)
- Automated sample loading
- Automatic termination: optical termination of the milling process supported by an image analysis module detecting the sample perforation or monitoring the evolution of surface topography
POWER REQUIREMENTS
- 100 - 120 V/4.0 A/60 Hz or 220 - 240 V/2.0 A/50 Hz – single phase
