Head of Surface Physics Department
Research Institute for Technical Physics and Material Science

Website: http://www.mfa.kfki.hu

Scope of Activity:

Auger Electron Spectroscopy, Thin Films and Nanostructures, Solid State Reactions. Improvement of Auger depth profiling : Dedicated Auger depth profiling device was developed based on the successfiul ion milling device of the Institute. The UHV version of TELETWIN ion source was modified by a new hot cathode and focusing system. The shape and position of the hot cathode and focus electrodes, respectively, were designed by computer simulation. With this improvement of the gun, ion sputtering even at 100 eV ion energy is possible. Using rotated specimen, glancing incidence angle and low ion energy (0.2 keV) depth resolution in Ge/Si multilayer system was determined to be 2.4 nm. Elastic peak electron spectroscopy (EPES) was shown to be useful in depth profiling, because of its variable penetration depth. It was applied for Mo/Si (3.3 nm) multilayer system, and it made possible the estimation of the damaged layer thickness.